Research

Research Overview

Our research primarily focuses on the scalable manufacturing of high-performance low-dimensional (low-D) nanomaterials, with the goal of advancing these materials from the research stage to commercially viable platforms for next-generation semiconductor technologies. Compared to mechanical exfoliation and chemical vapor deposition (CVD), which represent the mainstream methods for producing low-D materials, solution-based exfoliation provides a cost-effective and scalable approach for large-scale production. Starting from the synthesis of van der Waals crystals, we pursue solution-based exfoliation strategies to obtain low-D nanomaterial dispersions in high quality. These dispersions are assembled into electronic-grade thin films through conformal stacking enabled by precisely controlled solution processing. Through subsequent patterning and integration, we utilize the nanosheet films to realize various semiconductor devices, including electronic, optoelectronic, photonic, memory, and neuromorphic devices.

1. Scalable Production of Low-D Materials

The products of solution-based exfoliation are low-D nanomaterials dispersed in a liquid medium. Both the quality of the parent crystal and the exfoliation conditions are critical for obtaining high-quality nanomaterial dispersions. To this end, we aim to develop synthesis protocols to produce high-quality bulk crystals with diverse electronic properties, along with exfoliation strategies that yield nanomaterials in large quantities with controlled layer number, large lateral size, and minimal structural damage.

2. Thin-Film Assembly & Patterning Techniques

Low-D nanomaterial dispersions must first be assembled into thin films through solution processing prior to integration into semiconductor devices. Because device performance depends critically on the stacking morphology of the nanomaterials, our goal is to establish optimal processing parameters that yield nanomaterial films with controlled stacking morphology and uniform thickness. In addition, we aim to develop advanced printing techniques, including inkjet printing for patterned films and 3D printing for architected structures.

3. Conventional & Next-Generation Devices

The ultimate goal of developing scalable production strategies for high-quality low-D nanomaterials is their integration into various semiconductor devices to achieve superior performance. By combining conducting, semiconducting, and insulating films, we realize conventional devices such as field-effect transistors, logic gates, and photodetectors, as well as emerging platforms including neuromorphic electronics and optoelectronics. In parallel, we seek to expand our research into ferroelectric and ferromagnetic materials to develop advanced memory devices.

4. Unconventional Patterning Strategies

A key advantage of solution-processable nanomaterials is their ability to be assembled into patterned films without relying on lithography and etching processes used in the semiconductor industry. One of our core research thrusts is to develop innovative strategies that configure nanomaterial films into customizable patterns for next-generation device fabrication. We also focus on establishing facile patterning approaches that enable sophisticated 3D architectures beyond conventional lithographic limits to enhance device performance, including improved photoresponsivity and mechanical stretchability.

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